The surface properties of a largely amorphous Si3N4 sample prepared by nitridation with ammonia of amorphous silica at 1300°C have been studied by Fourier Transform Infrared Spectroscopy using adsorbed molecules such as water, benzene, acetonitrile, acetone, ammonia, triethylamine, chloroform, formic acid and methanol. The presence on the surface and the activity of SiOH, Si2NH and SiH groups as well as of basic nitrogens bonded to three silicon atoms has been evidenced. The development of an increased surface basic character of silicon nitride with respect to silica has also been pointed out. © 1986.
FT-IR study of the surface properties of silicon nitride
BUSCA, GUIDO;
1986-01-01
Abstract
The surface properties of a largely amorphous Si3N4 sample prepared by nitridation with ammonia of amorphous silica at 1300°C have been studied by Fourier Transform Infrared Spectroscopy using adsorbed molecules such as water, benzene, acetonitrile, acetone, ammonia, triethylamine, chloroform, formic acid and methanol. The presence on the surface and the activity of SiOH, Si2NH and SiH groups as well as of basic nitrogens bonded to three silicon atoms has been evidenced. The development of an increased surface basic character of silicon nitride with respect to silica has also been pointed out. © 1986.
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