This work presents wafer level deposition of thin Polyvinylidene Fluoride - Trifluoroethylene P(VDF-TrFE) films by spin coating and their further patterning by dry etching. Uniform and controlled thicknesses were obtained over a large area (4 inch Si wafer) by varying the concentration of solution and spnner's speed. Absence of any standard method makes it difficult to etch the polymer films from places like pads. A new dry etch recipe, developed for this purpose was used for the selective etching of polymer films. In situ polarization of the polymer film has also been addressed.
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|Titolo:||Deposition, processing and characterization of P(VDFTrFE) thin films for sensing applications|
|Data di pubblicazione:||2008|
|Appare nelle tipologie:||04.01 - Contributo in atti di convegno|