Titanium dioxide (TiO2) thin films were prepared by means of Anodic Spark Deposition (ASD) from thin and flat metallic titanium (Ti) films pre-deposited on high quality quartz slides by electron beam evaporation. AFM analysis indicates the formation of uniform mesoporous layers and a definite increase (about 50%) of the film thickness upon anodisation. The oxide mesoporous films have been characterized by XPS and Raman spectroscopy. Raman spectra of mesoporous TiO2 films were characterized by well-defined peaks related to anatase structure. An incomplete phase transition from anatase to rutile was observed upon annealing at temperatures up to 900 °C for 3h.
Mesoporous Titanium Dioxide Thin Layers for Gas Sensor Applications: Vacuum Deposition and Electrochemical Anodization
UTTIYA, SUREEPORN;CAVALLERI, ORNELLA;BIASOTTI, MICHELE;PIZZIGONI, GIULIO;CARNASCIALI, MARIA;PANI, MARCELLA;CAVIGLIA, DANIELE;MATTERA, LORENZO;CANEPA, MAURIZIO
2014-01-01
Abstract
Titanium dioxide (TiO2) thin films were prepared by means of Anodic Spark Deposition (ASD) from thin and flat metallic titanium (Ti) films pre-deposited on high quality quartz slides by electron beam evaporation. AFM analysis indicates the formation of uniform mesoporous layers and a definite increase (about 50%) of the film thickness upon anodisation. The oxide mesoporous films have been characterized by XPS and Raman spectroscopy. Raman spectra of mesoporous TiO2 films were characterized by well-defined peaks related to anatase structure. An incomplete phase transition from anatase to rutile was observed upon annealing at temperatures up to 900 °C for 3h.
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