Titanium dioxide (TiO2) thin films were prepared by means of electrochemical anodisation or anodic spark deposition (ASD) from thin and flat metallic titanium (Ti) films pre-deposited on high quality quartz substrates by electron beam evaporation. AFM analysis indicates the formation of uniform mesoporous layers and a definite increase about 50% of the film thickness upon anodisation and about 90% upon annealing. Anodised mesoporous TiO2 films have been characterized by Raman spectroscopy, which indicates the presence of well-defined peaks related to anatase structure. Phase transformation from anatase to rutile was observed after annealing at temperatures up to 900°C for 3h.

Mesoporous Titanium Dioxide Thin Films on Quartz via Electrochemical Anodisation Process

UTTIYA, SUREEPORN;CAVALLERI, ORNELLA;BIASOTTI, MICHELE;PANI, MARCELLA;CARNASCIALI, MARIA;CAVIGLIA, DANIELE;MATTERA, LORENZO;CANEPA, MAURIZIO
2015-01-01

Abstract

Titanium dioxide (TiO2) thin films were prepared by means of electrochemical anodisation or anodic spark deposition (ASD) from thin and flat metallic titanium (Ti) films pre-deposited on high quality quartz substrates by electron beam evaporation. AFM analysis indicates the formation of uniform mesoporous layers and a definite increase about 50% of the film thickness upon anodisation and about 90% upon annealing. Anodised mesoporous TiO2 films have been characterized by Raman spectroscopy, which indicates the presence of well-defined peaks related to anatase structure. Phase transformation from anatase to rutile was observed after annealing at temperatures up to 900°C for 3h.
2015
978-3-03835-513-7
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11567/906862
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